The preparation technology of CVD (Chemical Vapor Deposition) silicon carbide coating began in the 1950s and has been developed for nearly 70 years. During this long period of time, with the advancement of science and technology and the continuous promotion of application demands, the preparation technology of CVD silicon carbide coatings has also been constantly developed and improved.

The development of CVD silicon carbide coatings can be divided into the following stages:

1. Initial stage (1950s-1960s): The initial development of CVD silicon carbide coatings mainly focused on the laboratory, with a focus on studying the mechanisms of various CVD reactions and optimizing process conditions. Although there were not many research achievements at this stage, it laid the foundation for subsequent research.

2. Basic application stage (1970s-1980s): In the 1970s, CVD silicon carbide coating technology began to make some breakthroughs. At this time, the main research direction is the design and optimization of CVD reactors, as well as the study of chemical reactions and physical processes during CVD deposition. In the 1980s, some CVD silicon carbide coatings with special functions began to be applied in the industrial field, such as cutting tools, abrasives, ceramics, etc.

3. Application Expansion Stage (1990-2000s): In the 1990s, CVD silicon carbide coating technology began to be applied in a wider range of fields. With the rapid development of materials science, surface science, and nanotechnology, scientists have begun to pay attention to the study of the microstructure and properties of CVD silicon carbide coating materials. At this time, the research focus is mainly on the vapor deposition mechanism of thin films, material microstructure, and interfacial properties.

4. High performance application stage (2010s present): In the 2010s, the application field of CVD silicon carbide coating technology continued to expand, especially in the field of high-performance materials where significant progress has been made. For example, CVD silicon carbide coatings can be used to prepare high-temperature materials, high-pressure materials, and optical materials. In addition, CVD silicon carbide coating technology is constantly innovating and improving to meet the needs of emerging application fields such as energy storage, electronic devices, biomedicine, and sensors.

Overall, the preparation technology of CVD silicon carbide coatings has gone through a stage from laboratory research to application expansion in the past few decades, constantly making breakthroughs and progress. With the continuous development of technology and the increasing demand for applications, CVD silicon carbide coating technology will continue to face new challenges and opportunities in the future.